In this work, the authors investigate reactions that proceed when PDMS polymer films are treated with cyclic gas exposure sequences commonly used to perform aluminum oxide ALD. Atomic layer deposition (ALD) is a low temperature vapor phase thin film coating technique that has recently been used to modify and encapsulate a wide range of polymer materials. While PDMS polymer is simple to use, the surface hydrophobicity and adsorptive properties of PDMS limit its functionality, for example, in aqueous microfluidic applications.
The performance of polydimethylsiloxane (PDMS) elastomer in many of its applications, including surface molding and replication, microcontact lithography, and microfluidic device structures, is strongly influenced by its surface properties.
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